Fused Silica Windows, Wafers and Substrates
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Advanced Search Powered by KSearch 1.5b Fused Silica Windows, Wafers and SubstratesFused silica is high purity synthetic amorphous (non-crystalline) silicon dioxide (SiO2). It is formed by chemically combining Silicon and Oxygen, and is not to be confused with fused quartz which is derived from melted quartz crystals or silica sand. Because of its low thermal expansion coefficient and exceptional transmittance over a wide spectral range (especially in the UV), optical grade fused silica is an ideal material for thin precision UV optical windows, MEMS wafers, and optoelectronic substrates. Fused Silica's high purity enables it to withstand and transmit high energy laser pulses without significant absorption or damage to the material. Fused silica is also easily machinable and can be superpolished to < 7 angstroms surface roughness. Key Fused Silica (SiO2) Properties:
MORE PROPERTIES Fused Silica wafers and fused silica substrates commonly available from stock:
COMPLETE FUSED SILICA STOCK LIST Valley Design also offers precision machining services such as lapping, polishing, dicing, grinding, wafering, slicing, bonded wafer thinning of various other materials including Alumina, Aluminum Nitride, Ceramics, Sapphire, Crystals, Metals, Glass, Quartz and many others. Many materials in stock. Valley manufactures stock and custom substrates, wafers, windows, die, flat optical components and vacuum chucks for a variety of applications including Semiconductor, Medical, Aerospace, Photonics and Research. Incorporated for over 30 years, the company has been ISO 9002 certified since 1997, and operates 30,000 sq. ft. of facilities on both East and West Coasts. Return to Home Page: Edge polishing, angle polishing and facet optical polishing Updated: 09 July 2010 |
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